The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Dec. 13, 2021
International Business Machines Corporation, Armonk, NY (US);
Oki Gunawan, Westwood, NJ (US);
Devendra K. Sadana, Pleasantville, NY (US);
Douglas Bishop, Tarrytown, NY (US);
Tze-Chiang Chen, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A system for and methods of semiconductor testing and characterization are disclosed. The system includes a parallel dipole line (PDL) system for applying a magnetic field to a sample in a measurement chamber and electrical equipment for testing the sample. The testing includes applying a first light exposure to the sample with the PDL system set to zero magnetic field and monitoring longitudinal resistance (R) of the sample as intensity of the first light exposure varies. A second light exposure is applied with the PDL system set to maximum magnetic field, and transverse magnetoresistance (R) is monitored as light intensity varies. A third light exposure is applied with the PDL system set to minimum magnetic field, and transverse magnetoresistance (R) is monitored as light intensity varies. The characterization includes carrying out a photo-Hall analysis based on data from the testing.