The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2023
Filed:
Dec. 06, 2019
Canon Kabushiki Kaisha, Tokyo, JP;
Ryo Nawata, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint method includes contact step of bringing imprint material on shot region of substrate and pattern region of mold into contact with each other, alignment step of aligning the shot region and the pattern region after the contact step, first irradiation step of, before the alignment step is completed, irradiating frame-shaped portion of the imprint material with light, second irradiation step, started after the first irradiation step is started, irradiating at least part of the imprint material on the shot region with light under condition different from condition in the first irradiation step so that alignment error between the shot region and the pattern region is reduced, third irradiation step of irradiating the entire imprint material on the shot region with light after the alignment step is completed.