The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Mar. 07, 2019
Applicant:

Northwestern University, Evanston, IL (US);

Inventors:

Nathan S. Matsuda, Evanston, IL (US);

Oliver Strider Cossairt, Evanston, IL (US);

Jesse Chang, Granada Hills, CA (US);

Christopher Gezon, Wilmette, IL (US);

Assignee:

Northwestern University, Evanston, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 15/06 (2011.01); H04N 5/235 (2006.01); H04N 5/232 (2006.01); G06T 15/00 (2011.01); G06T 15/50 (2011.01); H04N 5/225 (2006.01);
U.S. Cl.
CPC ...
H04N 5/2354 (2013.01); G06T 15/005 (2013.01); G06T 15/06 (2013.01); G06T 15/506 (2013.01); H04N 5/2256 (2013.01); H04N 5/232411 (2018.08);
Abstract

A system to process images includes a light source configured to emit a first illumination pattern onto one or more first portions of a scene. The system also includes an image sensor configured to capture light reflected from the scene in response to the emitted first illumination pattern. The system also includes an optimizer configured to perform raytracing of the light reflected from the scene. The system further includes a processor operatively coupled to the optimizer. The processor is configured to determine a parameter of a surface of the scene based on the raytracing, cause the light source to emit a second illumination pattern onto one or more second portions of the scene based at least in part on the parameter of the surface, and refine the parameter of the surface of the scene based on additional raytracing performed on reflected light from the second illumination pattern.


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