The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Jan. 11, 2021
Applicant:

Datacolor Inc., Lawrenceville, NJ (US);

Inventors:

Hong Wei, Princeton, NJ (US);

Heath Barber, Fuquay Varina, NC (US);

Assignee:

DATACOLOR INC., Lawrenceville, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/235 (2006.01); G01J 3/52 (2006.01); G06N 3/08 (2006.01); G01J 3/50 (2006.01);
U.S. Cl.
CPC ...
H04N 5/2353 (2013.01); G01J 3/501 (2013.01); G01J 3/524 (2013.01); G06N 3/08 (2013.01); H04N 5/2354 (2013.01);
Abstract

In one or more implementations, the apparatus, systems and methods disclosed herein are directed to calibrating a smart phone with an arbitrary phone case for color lookup applications, wherein the calibration process includes obtaining, with the smartphone without the case equipped, a first measurement data set that includes at least one measurement of each of a black, white and grey calibration target; obtaining, with the smartphone with the case equipped, at least three exposure measurements of a white calibration target at least three different exposure times; calculating an optimized exposure time using at least the at least three exposure measurements; obtaining, with the smartphone with the case equipped, a second measurement data set that includes at least one measurement of each of a black, white and grey calibration target at the optimized exposure time; generating fitting parameters from the first and second measurement datasets; and storing the generated fitting parameters and optimized exposure time in at least one of a local or remote data storage device.


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