The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Nov. 04, 2020
Applicant:

Sap SE, Walldorf, DE;

Inventors:

Deng Feng Wan, Shanghai, CN;

Yangchun Deng, Shanghai, CN;

Hui Zhang, Shanghai, CN;

Zuxing Wang, Shanghai, CN;

Assignee:

SAP SE, Walldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 15/173 (2006.01); G06F 16/28 (2019.01); G06F 11/30 (2006.01); H04L 43/08 (2022.01); H04L 67/10 (2022.01); H04L 67/02 (2022.01); G06F 11/34 (2006.01); H04L 41/142 (2022.01); H04L 9/40 (2022.01);
U.S. Cl.
CPC ...
G06F 16/285 (2019.01); G06F 11/3006 (2013.01); G06F 11/3495 (2013.01); H04L 41/142 (2013.01); H04L 43/08 (2013.01); H04L 63/1408 (2013.01); H04L 63/1425 (2013.01); H04L 67/02 (2013.01); H04L 67/10 (2013.01);
Abstract

Requests are received for handling by a cloud computing environment which are then executed by the cloud computing environment. While each request is executing, performance metrics associated with the request are monitored. A vector is subsequently generated that encapsulates information associated with the request including the text within the request and the corresponding monitored performance metrics. Each request is then assigned (after it has been executed) to either a normal request cluster or an abnormal request cluster based on which cluster has a nearest mean relative to the corresponding vector. In addition, data can be provided that characterizes requests assigned to the abnormal request cluster. Related apparatus, systems, techniques and articles are also described.


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