The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2023
Filed:
Feb. 24, 2020
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Ryosuke Taniguchi, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Naoya Inoue, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/004 (2006.01); C08L 45/00 (2006.01); C08L 25/06 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); C08L 25/06 (2013.01); C08L 45/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01);
Abstract
A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition.