The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2023
Filed:
Jul. 01, 2019
Applicants:
Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Inventors:
Wei Li, Beijing, CN;
Jingjing Xia, Beijing, CN;
Bin Zhou, Beijing, CN;
Jun Liu, Beijing, CN;
Tongshang Su, Beijing, CN;
Yang Zhang, Beijing, CN;
Liangchen Yan, Beijing, CN;
Assignees:
Hefei Xinsheng Optoelectronics Technology Co., Ltd., Hefei, CN;
BOE Technology Group Co., Ltd., Beijing, CN;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); C08K 5/08 (2006.01); C08K 5/13 (2006.01); C08L 33/16 (2006.01); C08L 71/02 (2006.01); C08L 83/04 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08K 5/08 (2013.01); C08K 5/13 (2013.01); C08L 33/16 (2013.01); C08L 71/02 (2013.01); C08L 83/04 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); C08L 2203/20 (2013.01);
Abstract
Disclosed are a photoresist composition, a pixel definition structure and a manufacturing method thereof, and a display panel. The photoresist composition includes an organic film-forming resin, a superhydrophobic polymerizable monomer, a polyfunctional crosslinkable polymerizable monomer, a photoinitiator, an additive and a solvent.