The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

May. 19, 2020
Applicant:

Silicon Light Machines Corporation, Sunnyvale, CA (US);

Inventors:

Lars Eng, Los Altos, CA (US);

Alexander Payne, Ben Lomond, CA (US);

Daniel Eng, Los Altos, CA (US);

Satoshi Yamashita, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2006.01); G02B 5/18 (2006.01); G02B 27/30 (2006.01); G01J 3/02 (2006.01); G02B 27/16 (2006.01);
U.S. Cl.
CPC ...
G02B 26/0841 (2013.01); G01J 3/0229 (2013.01); G02B 5/1814 (2013.01); G02B 27/30 (2013.01); G02B 27/16 (2013.01);
Abstract

A system and method are provided for spectral shaping of light from a broadband source using a linear spatial light modulator (SLM). The system includes an illumination source generating light including a plurality of wavelengths, a lens to collimate the light and an aperture to define its angular spread, a diffraction grating to disperse the beam by wavelength, and a focusing element to focus the dispersed beams from the diffraction grating onto a plurality of pixels of the SLM. The SLM is configured to individually modulate the dispersed beams by diffracting light output therefrom into higher orders, where a diffraction angle of output light is greater than an input cone angle of incoming light from the illumination source.


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