The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2023
Filed:
May. 26, 2020
Chengdu University of Information Technology, Chengdu, CN;
Shoude Wang, Guiyang, CN;
Jiang Wang, Chengdu, CN;
Juan Wu, Chengdu, CN;
Jianxin He, Chengdu, CN;
Yuming Du, Chengdu, CN;
Xinggang Zhang, Chengdu, CN;
Shoude Wang, Guiyang, CN;
Chengdu University of Information Technology, Chengdu, CN;
Other;
Abstract
The present invention relates to a radiation source orientation technology. The invention discloses a method for optimizing the orientation performance of radiation source orientation system, which comprises the following steps: establishing a radiation source orientation matrix; obtaining the non-zero singular value of the orientation matrix; classifying orientation noise that affects the radiation source orientation system according to the distribution characteristic of noise energy; determining the optimal orientation matrix of the radiation source orientation system according to the minimum non-zero singular value σof the orientation matrix and its number of array elements m; determining the optimal orientation array according to the non-zero singular value of orientation matrix considering the distribution of different noise energy. The invention lays a foundation for the optimal design of a non-planar array in a radiation source orientation system. The optimal orientation matrix and array provided by the invention can be used to effectively improve the orientation accuracy of the radiation source orientation system and the resistance of the orientation system to interference.