The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Nov. 16, 2021
Applicant:

Nan Ya Plastics Corporation, Taipei, TW;

Inventors:

Te-Chao Liao, Taipei, TW;

Meng-Huai Han, Taipei, TW;

Chi-Lin Chen, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/22 (2006.01); G01R 27/26 (2006.01); G16C 20/30 (2019.01); G16C 10/00 (2019.01);
U.S. Cl.
CPC ...
G01N 27/221 (2013.01); G01R 27/26 (2013.01); G01R 27/2617 (2013.01); G16C 10/00 (2019.02); G16C 20/30 (2019.02);
Abstract

A method of calculating a dielectric constant and a dielectric loss of a polymer material including the following steps is provided: providing a polymer having an optimized molecular geometry; analyzing a dipole moment autocorrelation function of the polymer having the optimized molecular geometry; fitting the dipole moment autocorrelation function of the polymer having the optimized molecular geometry via a relaxation function to obtain a corresponding fitting function; calculating a static permittivity of the polymer having the optimized molecular geometry; and obtaining a complex permittivity spectrum via the fitting function and the static permittivity, so as to calculate a corresponding dielectric constant and dielectric loss of the polymer having the optimized molecular geometry.


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