The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Apr. 23, 2019
Applicant:

King Fahd University of Petroleum and Minerals, Dhahran, SA;

Inventors:

Khaled Mezghani, Dhahran, SA;

Kahraman Demir, Dhahran, SA;

Adnen Mezghani, Dhahran, SA;

Ouail Balah, Dhahran, SA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C01B 32/164 (2017.01); C23C 16/26 (2006.01); C23C 16/455 (2006.01); B82Y 40/00 (2011.01); C23C 16/52 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); B82Y 40/00 (2013.01); C01B 32/164 (2017.08); C23C 16/26 (2013.01); C23C 16/4409 (2013.01); C23C 16/455 (2013.01); C23C 16/52 (2013.01); B82Y 30/00 (2013.01); C01B 2202/08 (2013.01); C01B 2202/34 (2013.01); C01P 2004/13 (2013.01);
Abstract

A carbon nanotube (CNT) growth apparatus includes: a body; an inlet cap; an outlet cap; insulation extending through a portion of an interior of the body, the insulation including a first stage and a second stage, a flow tube extending through the inlet cap and passing coaxially through the first stage of the insulation, the flow tube configured to receive and flow a fluid to the interior of the body; a gas heater including a plurality of heat pipes configured to be inserted in the first stage of the insulation, the plurality of heat pipes being disposed adjacent to the flow tube; a substrate heater incorporated in the second stage of the insulation; and a temperature controller configured to adjust a temperature of the gas heater and substrate heater, wherein a removed portion of the second stage is configured to provide an unobstructed view of the substrate.


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