The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Aug. 22, 2017
Applicant:

Dai-ichi Kogyo Seiyaku Co., Ltd., Kyoto, JP;

Inventors:

Masatake Joyabu, Kyoto, JP;

Kei Shiohara, Kyoto, JP;

Asako Ogasawara, Kyoto, JP;

Takuro Kimura, Kyoto, JP;

Chi Tao, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 33/30 (2006.01); C07C 43/166 (2006.01); C08F 2/26 (2006.01); C08F 2/30 (2006.01); C08F 216/10 (2006.01); C08F 12/08 (2006.01); C08F 20/06 (2006.01); C08F 20/18 (2006.01); C08K 5/06 (2006.01);
U.S. Cl.
CPC ...
C07C 43/166 (2013.01); C08F 2/26 (2013.01); C08F 12/08 (2013.01); C08F 20/06 (2013.01); C08F 20/18 (2013.01); C08K 5/06 (2013.01); C07C 33/30 (2013.01); C08F 216/10 (2013.01);
Abstract

The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, Rrepresents one or two groups selected from groups below, Drepresents a polymerizable unsaturated group represented by chemical formula D-1 or D-2 below, Rrepresents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, Arepresents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.


Find Patent Forward Citations

Loading…