The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2023

Filed:

Jan. 20, 2021
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Juyoun Kim, Suwon-si, KR;

Sangjung Kang, Suwon-si, KR;

Jinwoo Kim, Hwaseong-si, KR;

Junmo Park, Seoul, KR;

Seulgi Yun, Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/49 (2006.01); H01L 27/092 (2006.01); H01L 29/423 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4966 (2013.01); H01L 27/092 (2013.01); H01L 29/42392 (2013.01); H01L 29/78696 (2013.01);
Abstract

A semiconductor memory device includes a substrate having a first region and a second region. A first gate electrode layer is on the first region and includes a first conductive layer including a first plurality of layers, and includes a first upper conductive layer on the first conductive layer. A second gate electrode layer is on the second region and includes a second conductive layer including a second plurality of layers, and includes a second upper conductive layer on the second conductive layer. At least one of the first plurality of layers includes titanium oxynitride (TiON). A first transistor including the first gate electrode layer and a second transistor including the second gate electrode layer are metal oxide semiconductor field effect transistors (MOSFETs) having the same channel conductivity type, and a threshold voltage of the first transistor is smaller than a threshold voltage of the second transistor.


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