The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2023

Filed:

Jun. 17, 2021
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Koji Tanaka, Tokyo, JP;

Koichi Nishi, Tokyo, JP;

Ze Chen, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/739 (2006.01); H01L 21/265 (2006.01); H01L 29/861 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0615 (2013.01); H01L 21/26513 (2013.01); H01L 29/7397 (2013.01); H01L 29/8613 (2013.01);
Abstract

A semiconductor device includes: a semiconductor substrate including a front surface, a back surface that is opposite to the front surface, and a drift layer of a first conductive type disposed between the front surface and the back surface; a first diffusion layer of a second conductive type provided between the drift layer and the front surface; a second diffusion layer provided between the drift layer and the back surface; a first buffer layer of the first conductive type provided between the drift layer and the second diffusion layer, having a concentration higher than that of the drift layer, and into which a proton is injected; and a second buffer layer of the first conductive type provided between the first buffer layer and the second diffusion layer and having a concentration higher than that of the drift layer, wherein a peak concentration of the second buffer layer is higher than a peak concentration of the first buffer layer, an impurity concentration of the first buffer layer gradually decreases toward the back surface, a length from a peak position of the first buffer layer to a boundary between the drift layer and the first buffer layer is represented by Xa, a length from the peak position to a boundary between the first buffer layer and the second buffer layer is represented by Xb, and Xb>5 Xa.


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