The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2023

Filed:

Jan. 27, 2021
Applicants:

Beihai Hkc Optoelectronics Technology Co., Ltd., Guangxi, CN;

Hkc Corporation Limited, Guangdong, CN;

Inventors:

Yuming Xia, Guangxi, CN;

En-tsung Cho, Guangxi, CN;

Wei Li, Guangxi, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); G03F 7/70066 (2013.01);
Abstract

Disclosed are a method for manufacturing an array substrate, an array substrate and a display device. The method includes the following operations: sequentially forming a gate, a gate insulation layer, an active layer, an ohmic contact layer and a metal layer on a base substrate; forming a photolithography mask on the metal layer, a thickness of the photolithography mask being between 1.7 μm and 1.8 μm; exposing the photolithography mask through a mask plate to make a uniformity of the photolithography mask in a half-exposed area of the mask plate reach a preset uniformity; and manufacturing the array substrate based on the exposed photolithography mask.


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