The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2023

Filed:

Oct. 27, 2021
Applicant:

Hannstar Display Corporation, Taipei, TW;

Inventors:

Yao-Chih Chuang, Tainan, TW;

Mei-Ling Chou, Tainan, TW;

Ming-Liang Chen, Tainan, TW;

Chih-Wei Chen, Tainan, TW;

Chia-Yu Liu, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/044 (2006.01); G06F 3/041 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
G06F 3/0443 (2019.05); G06F 3/0412 (2013.01); G06F 3/0446 (2019.05); G02F 1/13338 (2013.01); G06F 2203/04111 (2013.01); G06F 2203/04112 (2013.01);
Abstract

The disclosure provides a touch-sensing panel, which includes a substrate, a first mesh pattern, an insulating layer, and a second mesh pattern. The substrate has an active area and a peripheral area. The first mesh pattern is located in the active area. The insulating layer is disposed on the first mesh pattern. The second mesh pattern is located in the active area. At least a part of the second mesh pattern is disposed on the insulating layer. Each of the first mesh pattern and the second mesh pattern includes a plurality of mesh lines. A reflectivity of a surface of one of the first mesh pattern and the second pattern is smaller than a reflectivity of a surface of the other of the first mesh pattern and the second mesh pattern, and a width of each of the mesh lines of the one of the first mesh pattern and the second mesh pattern is smaller than a width of each of the mesh lines of the other of the first mesh pattern and the second mesh pattern.


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