The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2023

Filed:

Oct. 20, 2021
Applicant:

Immersion Corporation, San Francisco, CA (US);

Inventors:

Majid Sheikholeslami, Burlington, CA;

Danny A. Grant, Montreal, CA;

Lionel Bravard, Montreal, CA;

Christopher Ullrich, Ventura, CA (US);

Vahid Khoshkava, Laval, CA;

Jamal Saboune, Montreal, CA;

Juan Manuel Cruz Hernandez, Westmount, CA;

Assignee:

IMMERSION CORPORATION, San Francisco, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 3/041 (2006.01); G06F 3/01 (2006.01);
U.S. Cl.
CPC ...
G06F 3/016 (2013.01);
Abstract

Apparatus and methods for localizing one or more effects in a haptic interface with a user interface having a primary zone and at least one secondary zone are provided. When a desired haptic effect is generated within the primary zone, unwanted resultant haptic effects in the at least one secondary zone may be suppressed. A primary actuator is located in the primary zone, and at least one secondary actuator is located in the at least one secondary zone. At least one controller selectively and controllably generates the haptic effect produced by the primary actuator in the primary zone, and selectively and controllably actuates the at least one secondary actuator within the at least one secondary zone to generate a suppression effect therein. The at least one secondary actuator can be used to localize and/or amplify the haptic effect through constructive and/or destructive interference. Numerous other aspects are provided.


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