The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2023
Filed:
May. 25, 2021
Applicant:
Zeon Corporation, Tokyo, JP;
Inventors:
Hiromu Mashima, Tokyo, JP;
Takamichi Inomata, Tokyo, JP;
Assignee:
ZEON CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G02F 1/1335 (2006.01); H01L 51/52 (2006.01); B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/305 (2013.01); B29D 11/00644 (2013.01); G02F 1/133528 (2013.01); H01L 51/5281 (2013.01);
Abstract
A method for producing a polarizing plate including a polarizer and a substrate film is provided. The method comprises: stretching a primary film to obtain a polarizer material film; providing an unstretched substrate film on the polarizer material film to obtain a layered body; and stretching the layered body to obtain the polarizing plate. The polarizer includes a dichroic material and has a thickness T of 20 μm or less. A phase difference Re in an in-plane direction of the substrate film in the polarizing plate is 20 nm or less.