logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11572533 B1

PDFFull Text
Date of Patent:
Feb. 07, 2023

Filed:

May. 20, 2019

Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer

Applicant:

Tokuyama Corporation, Yamaguchi, JP;

Inventors:

Takafumi Shimoda, Yamaguchi, JP;

Yuki Kikkawa, Yamaguchi, JP;

Takayuki Negishi, Yamaguchi, JP;

Seiji Tono, Yamaguchi, JP;

Assignee:

Tokuyama Corporation, Yamaguchi, JP;

Attorney:

Cahn & Samuels, LLP

Primary Examiner:

Gregory E Webb

Int. Cl.
CPC ...
C07C 209/66 (2006.01); C11D 7/32 (2006.01); C07C 209/68 (2006.01); C07C 211/63 (2006.01); C11D 11/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C11D 7/3209 (2013.01); C07C 209/68 (2013.01); C07C 211/63 (2013.01); C11D 11/0047 (2013.01); H01L 21/02057 (2013.01);
Abstract

A method for producing a quaternary alkylammonium hypochlorite solution includes a preparation step of preparing a quaternary alkylammonium hydroxide solution, and a reaction step of bringing the quaternary alkylammonium hydroxide solution into contact with chlorine, wherein a carbon dioxide concentration in a gas phase portion in the reaction step is 100 ppm by volume or less, and pH of a liquid phase portion in the reaction step is 10.5 or more.

Find Patent Forward Citations

Shimoda, Takafumi. (2023). Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer (U.S. Patent No. 11572533). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11572533

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…