The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2023
Filed:
Mar. 12, 2019
Terapore Technologies, Inc., South San Francisco, CA (US);
Rachel M. Dorin, San Carlos, CA (US);
Yibei Gu, San Francisco, CA (US);
Jayraj K. Shethji, San Francisco, CA (US);
Spencer Robbins, San Carlos, CA (US);
TeraPore Technologies, Inc., South San Francisco, CA (US);
Abstract
A mesoporous isoporous asymmetric material includes at least one diblock or multiblock copolymer, wherein the material has a transition layer having a thickness of at least 300 nm and a low macrovoid density, and the material has a sub-structure adjacent to said transition layer and said sub-structure comprises a high macrovoid density. A method for producing mesoporous isoporous asymmetric materials having macrovoids can include: dissolving at least one diblock or multiblock copolymer in a solution, the solution having one or more solvents and one or more nonsolvents, to form a polymer solution; dispensing the polymer solution onto a substrate or mold, or through a die or template; removing at least a portion of solvent and/or nonsolvent from the polymer solution to form a concentrated polymer solution; and exposing the concentrated polymer solution to a nonsolvent causing precipitation of at least a portion of the polymer from the concentrated polymer solution.