The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
Jun. 29, 2018
Applicant:
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Taiki Hinode, Kyoto, JP;
Sadamu Fujii, Kyoto, JP;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B08B 3/08 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); B08B 3/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02063 (2013.01); B08B 3/08 (2013.01); H01L 21/02052 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01); B08B 3/041 (2013.01);
Abstract
The natural oxidation film of polysilicon, which is exposed at a side surface of a recess portionprovided in a substrate W, is removed and a thin filmof polysilicon is exposed at the side surface of the recess portion. Liquid IPA is brought into contact with the thin filmof polysilicon after the natural oxidation film of polysilicon is removed. Diluted ammonia water is supplied to the substrate W and the thin filmof polysilicon is etched after IPA comes into contact with the thin filmof polysilicon.