The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
Jun. 21, 2019
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sung-gil Kang, Hwaseong-si, KR;
Min-seop Park, Hwaseong-si, KR;
Gon-jun Kim, Suwon-si, KR;
Jae-jik Baek, Seongnam-si, KR;
Jae-jin Shin, Seoul, KR;
In-hye Jeong, Changnyeong-gun, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A substrate processing apparatus includes a processing chamber; a susceptor provided in the processing chamber, wherein the susceptor is configured to support a substrate; a first plasma generator disposed on one side of the processing chamber; and a second plasma generator disposed on another side of the processing chamber, wherein the second plasma generator is configured to generate plasma by simultaneously supplying a sinusoidal wave signal and a non-sinusoidal wave signal to the susceptor. By using a substrate processing apparatus, a signal source device, and a method of processing a material layer according to the inventive concept, a smooth etched surface may be obtained for a crystalline material layer without a risk of device damage by RDC.