The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2023

Filed:

Nov. 04, 2019
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Eun Kyu Her, Daejeon, KR;

Jeong Ho Park, Daejeon, KR;

Seong Min Park, Daejeon, KR;

Sang Choll Han, Daejeon, KR;

Bu Gon Shin, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); G02B 5/18 (2006.01); B29C 33/38 (2006.01); B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1857 (2013.01); B29C 33/3842 (2013.01); B29D 11/00769 (2013.01);
Abstract

A plasma etching method using a Faraday cage, which effectively produces a blazed grating pattern.


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