The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2023

Filed:

Aug. 20, 2020
Applicants:

Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;

Boe Technology Group Co., Ltd., Beijing, CN;

Inventor:

Shihsyong Huang, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/04 (2006.01); H01L 27/32 (2006.01); G06F 1/18 (2006.01); C23C 14/04 (2006.01); B05C 21/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); B05C 21/005 (2013.01); C23C 14/042 (2013.01); G06F 1/189 (2013.01); H01L 27/3276 (2013.01);
Abstract

The present disclosure provides a fine metal mask and a method for manufacturing the same, a mask assembly and a display substrate. The fine metal mask includes: a mask pattern region and a non-mask region disposed at a periphery of the mask pattern region. The mask pattern region includes at least one first grid pattern region, a barrier ring pattern disposed around the first grid pattern region, and a second grid pattern region disposed at an outer periphery of the barrier ring pattern.


Find Patent Forward Citations

Huang, Shihsyong. (2023). Fine metal mask and method for manufacturing the same, mask assembly and display substrate (U.S. Patent No. 11566323). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11566323

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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