The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2023
Filed:
Feb. 02, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Masayoshi Fujimoto, Tochigi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint apparatus including an irradiation unit configured to irradiate a peripheral region of a pattern region of a mold with light while the mold is in contact with an imprint material on a substrate so as to make a polymerization degree of the imprint material between the peripheral region and the substrate fall within a range higher than a polymerization degree in an initial state when the imprint material is supplied onto the substrate and lower than a polymerization degree in a final state when the imprint material is cured, and a control unit configured to control, for each shot region on the substrate, a value of a second parameter for controlling irradiation with the light from the irradiation unit based on a value of a first parameter for controlling a contact step.