The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2023

Filed:

Mar. 31, 2021
Applicant:

Black Swan Graphene Inc., Toronto, CA;

Inventors:

Paul Ladislaus, Sedgefield, GB;

Lee Glasgow, Consett, GB;

Ronan McHale, Jesmond, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B02C 19/06 (2006.01); C01B 32/19 (2017.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B02C 19/066 (2013.01); C01B 32/19 (2017.08); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

The present invention provides an apparatus for the production of Graphene and similar atomic scale laminar materials by the delamination of a bulk laminar material, such as graphite. This apparatus provides prolonged head life and avoids catastrophic head wear in an isolated region. Overall product quality over time is better maintained. Also, the benefit of a self-unblocking delamination apparatus can be achieved whilst maintaining high product quality and consistency. Relatively small variation in gap size being sufficient to avoid blockage, such as occurs by the aggregation of large particles or groups of particles in the high shear gap used for delamination.


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