The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2023
Filed:
Feb. 11, 2019
Meta Platforms Technologies, Llc, Menlo Park, CA (US);
Oleg Yaroshchuk, Redmond, WA (US);
Wai Sze Tiffany Lam, Vancouver, CA;
Scott Charles McEldowney, Redmond, WA (US);
Lu Lu, Kirkland, WA (US);
META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US);
Abstract
The invention relates to a method of creation of three-dimensional alignment patterns that includes providing a layer of optically recordable and polarization sensitive material having a thickness that is greater than, or equal to, a predefined thickness, and concurrently illuminating the optically recordable medium with two coherent beam of same or different polarization with predetermined angle between the beams such that the said beams impinge from the same side or from the opposite sides upon the layer of the recordable material. The invention further relates to polarization volume holograms based on the said alignment patterns and polarization holographic element including a single layer or a stack of several layers of optically recordable materials containing single or multiple polarization volume holograms.