The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2023

Filed:

Jun. 25, 2020
Applicant:

Board of Regents, the University of Texas System, Austin, TX (US);

Inventors:

Alexander A. Demkov, Austin, TX (US);

Marc Reynaud, Austin, TX (US);

Agham Posadas, Round Rock, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/055 (2006.01); C23C 16/455 (2006.01); C30B 29/32 (2006.01); C30B 23/02 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
G02F 1/0551 (2013.01); C23C 16/409 (2013.01); C23C 16/45525 (2013.01); C30B 23/025 (2013.01); C30B 29/32 (2013.01);
Abstract

Various embodiments of the present technology enable growth of a-axis oriented barium titanate (BTO) films by inserting a relaxed strain control layer having a larger lattice constant than the c-axis of BTO and a similar thermal expansion mismatch. As a result, in-plane tensile stress causes BTO to grow with its ferroelectric polarization in-plane. Some embodiments allow for BTO films to immediately be grown on silicon with a-axis orientation, and without the need to create thick layers for relaxation. Using various embodiments of the present technology, the BTO can be grown in-plane with minimal dislocation density that is confined to the interface region.


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