The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2023
Filed:
Dec. 21, 2018
Applicant:
Leica Microsystems Cms Gmbh, Wetzlar, DE;
Inventor:
Florian Fahrbach, Mannheim, DE;
Assignee:
LEICA MICROSYSTEMS CMS GMBH, Wetzlar, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/02 (2006.01); G02B 21/24 (2006.01); G01N 21/41 (2006.01); G02B 21/00 (2006.01);
U.S. Cl.
CPC ...
G02B 21/245 (2013.01); G01N 21/4133 (2013.01); G02B 21/006 (2013.01); G01N 2201/02 (2013.01);
Abstract
A method for adjusting a focus of an optical system includes focusing measurement light in a sample space using an optical arrangement. The measurement light is transmitted on a sample side of the optical arrangement through at least one optical medium. The measurement light reflected by a reflector and transmitted through a further optical arrangement is detected using a detector arrangement. A working distance between the optical arrangement and the reflector is ascertained based on the measurement light detected by the detector, wherein a focus of the measurement light lies on the reflector for the working distance.