The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2023
Filed:
Jul. 04, 2019
Hitachi High-tech Corporation, Tokyo, JP;
Kenichiro Yamada, Tokyo, JP;
Mitsuru Nagasawa, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
To implement, when a plurality of patterns are included in a field of view during measurement of scattered light in spectral scatterometry, removal of an influence of a pattern outside a dimension (three-dimensional shape) management target from spectral reflection intensity in the field of view without modeling the pattern outside the dimension management target. A three-dimensional shape detection apparatusincludes a spectral reflection intensity measurement unit configured to measure spectral reflection intensity in a field of view of a light spot by irradiating a sampleas a target with the light spot, and detects a three-dimensional shape in the field of view of the light spot based on the measured spectral reflection intensity. The three-dimensional shape detection apparatus further has a spectral feature value calculation unit configured to calculate a spectral feature value in a first region in the field of view of the light spot in advance in an external control apparatusthereof, and an area ratio estimation unit configured to estimate an area ratio between an area of the first region in the field of view of the light spot and an area of a second region outside the first region in the field of view of the light spot.