The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2023

Filed:

Jun. 29, 2021
Applicant:

Ion Beam Applications S.a., Louvain-la-Neuve, BE;

Inventors:

Rudi Labarbe, Louvain-la-Neuve, BE;

Lucian Hotoiu, Louvain-la-Neuve, BE;

Arnaud Pin, Louvain-la-Neuve, BE;

Assignee:

Ion Beam Applications, Louvain-la-Neuve, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61N 5/10 (2006.01);
U.S. Cl.
CPC ...
A61N 5/1031 (2013.01); A61N 5/1042 (2013.01); A61N 5/1077 (2013.01); A61N 2005/1087 (2013.01);
Abstract

A treatment planning system for generating a plan for treatment by radiation with charged particles beams applied by pencil beam scanning onto a target tissue comprising tumoral cells is provided. The treatment planning system performs a dose definition stage defining the doses to be deposited within the peripheral surface, a beam definition stage defining positions and dimensions of the beamlets of the PBS during the at least one high rate fraction, the beams definition stage including a dose rate definition stage comprising at least one high rate fraction, and a beamlets scanning sequence stage defining a scanning sequence of irradiation of the beamlets. The beamlets scanning sequence stage optimizes a time sequence of beamlets emission such that at the end of a fraction j, a dose is deposited onto at least a predefined fraction of each specific volume at a mean deposition rate superior or equal to a predefined value.


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