The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2023

Filed:

Oct. 06, 2020
Applicant:

Envision Diagnostics, Inc., El Segundo, CA (US);

Inventors:

Alexander C. Walsh, Los Angeles, CA (US);

Paul G. Updike, Cerritos, CA (US);

Richard Castro, Santa Monica, CA (US);

Assignee:

Envision Diagnostics, Inc., El Segundo, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/00 (2006.01); A61B 3/10 (2006.01); A61B 3/15 (2006.01);
U.S. Cl.
CPC ...
A61B 3/0083 (2013.01); A61B 3/10 (2013.01); A61B 3/102 (2013.01); A61B 3/152 (2013.01); A61B 3/154 (2013.01); A61B 3/156 (2013.01);
Abstract

A mask for performing an eye exam of a subject includes one or more optically transparent sections for transmitting an incident light beam therethrough and incident on the subject's eye. In some embodiments, the one or more optically transparent sections are coated with an anti-reflective coating configured to reduce reflection of the incident light beam by the one or more optically transparent sections. In some embodiments, the one or more optically transparent sections may have a portion thereof that is tilted with respect to the incident light beam when the mask is optically interfaced with the docking portion of an ophthalmic instrument, such that the incident light beam forms a finite angle of incidence with respect to the corresponding portion of the optically transparent sections.


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