The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2023

Filed:

Feb. 24, 2021
Applicant:

Sharp Kabushiki Kaisha, Sakai, JP;

Inventors:

Tetsuo Kikuchi, Sakai, JP;

Tohru Daitoh, Sakai, JP;

Masahiko Suzuki, Sakai, JP;

Setsuji Nishimiya, Sakai, JP;

Kengo Hara, Sakai, JP;

Hitoshi Takahata, Sakai, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/24 (2006.01); H01L 29/786 (2006.01); G02F 1/1368 (2006.01); H01L 29/49 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7869 (2013.01); G02F 1/1368 (2013.01); H01L 27/1225 (2013.01); H01L 29/24 (2013.01); H01L 29/4908 (2013.01); H01L 29/78696 (2013.01); H01L 27/323 (2013.01); H01L 27/3262 (2013.01);
Abstract

An active matrix substrate has pixel regions, and includes a substrate, pixel TFTs disposed to respectively correspond to the pixel regions, and pixel electrodes electrically connected to the pixel TFTs. The pixel TFTs are each a top gate structure TFT that has an oxide semiconductor layer, a gate insulating layer on the oxide semiconductor layer, and a gate electrode opposing the oxide semiconductor layer with the gate insulating layer therebetween. The gate insulating layer is formed of silicon oxide and includes a lower layer contacting the oxide semiconductor layer, and an upper layer on the lower layer. The lower layer H/N ratio of hydrogen atoms to nitrogen atoms in the lower layer is 1.5 to 5.0. The upper layer H/N ratio of hydrogen atoms to nitrogen atoms in the upper layer is 0.9 to 2.0. The lower layer H/N ratio is larger than the upper layer H/N ratio.


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