The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2023
Filed:
Mar. 01, 2022
Cpg Technologies, Llc, Italy, TX (US);
Buford Randall Jean, Lorena, TX (US);
James D. Lilly, Waxahachie, TX (US);
Benjamin J. Tinlin, Waco, TX (US);
CPG Technologies, LLC, Italy, TX (US);
Abstract
Various examples are provided related to anisotropic constitutive parameters (ACPs) that can be used to launch Zenneck surface waves. In one example, among others, an ACP system includes an array of ACP elements distributed above a medium such as, e.g., a terrestrial medium. The array of ACP elements can include one or more horizontal layers of radial resistive artificial anisotropic dielectric (RRAAD) elements positioned in one or more orientations above the terrestrial medium. The ACP system can include vertical lossless artificial anisotropic dielectric (VLAAD) elements distributed above the terrestrial medium in a third orientation perpendicular to the horizontal layer or layers. The ACP system can also include horizontal artificial anisotropic magnetic permeability (HAAMP) elements distributed above the terrestrial medium. The array of ACP elements can be distributed about a launching structure, which can be excited with an electromagnetic field to facilitate the launch of a Zenneck surface wave.