The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 17, 2023

Filed:

Jul. 16, 2021
Applicant:

Raytheon Technologies Corporation, Farmington, CT (US);

Inventors:

Brian T. Hazel, Avon, CT (US);

Raymond Surace, Newington, CT (US);

Robert A. White, III, Meriden, CT (US);

Zhongfen Ding, South Windsor, CT (US);

Assignee:

RAYTHEON TECHNOLOGIES CORPORATION, Farmington, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F02C 7/28 (2006.01); F02C 3/04 (2006.01); C23C 4/134 (2016.01); C23C 4/11 (2016.01); C23C 4/18 (2006.01);
U.S. Cl.
CPC ...
F02C 7/28 (2013.01); F02C 3/04 (2013.01); C23C 4/11 (2016.01); C23C 4/134 (2016.01); C23C 4/18 (2013.01); F05D 2220/32 (2013.01); F05D 2240/35 (2013.01); F05D 2300/611 (2013.01);
Abstract

A seal system includes a ceramic component, a metallic component, a coating system. The ceramic component has a first surface region that defines a first surface roughness. The metallic component is situated adjacent to the first surface region and has a second surface region facing the first surface region. The coating system includes a silicon-containing layer on the surface region of the ceramic component and barrier layer on the silicon-containing layer. The silicon containing layer has a surface in contact with the barrier layer and the barrier layer has a surface in contact with the metallic component. The surface of the barrier layer has a second surface roughness that is less than the first surface roughness. The barrier layer serves to limit interaction between silicon of the silicon-containing layer and elements of the metallic component. The barrier layer includes at least one of mullite, zircon, or hafnon.


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