The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2023
Filed:
Feb. 10, 2020
Applicant:
Young Chang Chemical Co., Ltd, Gyeongsangbuk-do, KR;
Inventors:
Seung Hun Lee, Daegu, KR;
Seung Hyun Lee, Daegu, KR;
Seong Hwan Kim, Daegu, KR;
Seung Oh Jin, Daegu, KR;
Assignee:
YOUNG CHANG CHEMICAL CO., LTD, Gyeongsangbuk-Do, KR;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/06 (2006.01); C09K 13/08 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09K 13/06 (2013.01); C09K 13/08 (2013.01); H01L 21/30604 (2013.01);
Abstract
The present invention relates to an etching composition for selectively etching a silicon nitride layer. The etching composition includes an inorganic acid, an epoxy-based silicon compound, and water. The etching composition of the present invention selectively removes a silicon nitride layer while minimizing damage to an underlying metal layer and preventing a silicon oxide layer from being etched.