The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2023
Filed:
Dec. 12, 2018
Applicant:
Nanomakers, Rambouillet, FR;
Inventors:
Jean-François Perrin, Vélizy-Villacoublay, FR;
Yohan Oudart, Versailles, FR;
Assignee:
NANOMAKERS, Rambouillet, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); C04B 35/83 (2006.01); C01B 33/02 (2006.01); H01L 31/18 (2006.01); H01M 4/38 (2006.01); H01M 4/62 (2006.01); H01L 31/0445 (2014.01);
U.S. Cl.
CPC ...
C04B 35/83 (2013.01); C01B 33/02 (2013.01); H01L 31/1804 (2013.01); H01M 4/0404 (2013.01); H01M 4/386 (2013.01); H01M 4/625 (2013.01); C01P 2004/62 (2013.01); C01P 2006/11 (2013.01); C01P 2006/12 (2013.01); C01P 2006/40 (2013.01); C04B 2235/422 (2013.01); C04B 2235/428 (2013.01); C04B 2235/5248 (2013.01); H01L 31/0445 (2014.12);
Abstract
A production method is provided in which submicronic particles containing silicon are incorporated into a matrix, wherein, during the incorporation of the particles, the particles are in a compacted state with a bulk density of more than 0.10 grams per cubic centimeter, and the compacted particles have a specific surface area at least 70% of that of the particles considered separately without contact between each other.