The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2023
Filed:
Jul. 17, 2018
Heptagon Micro Optics Pte. Ltd., Singapore, SG;
QiChuan Yu, Singapore, SG;
Han Nee Ng, Singapore, SG;
Tobias Senn, Rüschlikon, CH;
John A. Vidallon, Singapore, SG;
Ramon Opeda, Singapore, SG;
Attilio Ferrari, Rüschlikon, CH;
Harmut Rudmann, Rüschlikon, CH;
Martin Schubert, Rüschlikon, CH;
Heptagon Micro Optics Pte. Ltd., Singapore, SG;
Abstract
The method regards manufacturing devices by replication, wherein each of the devices comprises a device surface. The method comprises producing the devices from a replication material by replication using a replication tool (), wherein the replication tool () comprises a tool material comprising replication sites () comprising a replication surface () each. Each of the replication surfaces () corresponds to a negative of the device surface of a respective one of the devices. The tool material comprises, in addition to the replication sites, one or more mitigating features () for reducing asymmetric form errors of the device surfaces. Replication tools () and methods for manufacturing these are also described.