The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2023

Filed:

Mar. 17, 2020
Applicants:

The Regents of the University of Michigan, Ann Arbor, MI (US);

Trustees of Boston University, Boston, MA (US);

Inventors:

Stephen R. Forrest, Ann Arbor, MI (US);

Jeffrey A. Horowitz, Ann Arbor, MI (US);

David J. Bishop, Brookline, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/08 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01); B81B 7/00 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0004 (2013.01); B81B 7/008 (2013.01); H01L 51/56 (2013.01); H01L 51/5206 (2013.01); H01L 51/5221 (2013.01);
Abstract

An organic vapor deposition device comprises a print head, comprising a source channel, in fluid communication with a flow of carrier gas and a quantity of organic source material configured to mix with the carrier gas, a nozzle having a deposition outlet, in fluid communication with the source channel, and a shutter configured at least to open and close the deposition outlet, wherein the print heat is configured to allow the flow of carrier gas and the organic source material exit the deposition outlet when the shutter is in an open position, and to prevent the flow of carrier gas and the organic source material from exiting the deposition outlet when the shutter is in a closed position. A method of manufacturing a device comprising an organic feature on a substrate is also described.


Find Patent Forward Citations

Loading…