The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2023

Filed:

Jun. 10, 2020
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Henry Litzmann Edwards, Garland, TX (US);

Andrew D. Strachan, Santa Clara, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 21/762 (2006.01); H01L 29/10 (2006.01); H01L 21/266 (2006.01); H01L 29/40 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66681 (2013.01); H01L 21/266 (2013.01); H01L 21/76205 (2013.01); H01L 29/063 (2013.01); H01L 29/0634 (2013.01); H01L 29/0653 (2013.01); H01L 29/402 (2013.01); H01L 29/66659 (2013.01); H01L 29/7823 (2013.01); H01L 29/7835 (2013.01); H01L 21/76224 (2013.01); H01L 29/1045 (2013.01);
Abstract

A method to fabricate a transistor includes implanting dopants into a semiconductor to form a drift layer having majority carriers of a first type; etching a trench into the semiconductor; thermally growing an oxide liner into and on the trench and the drift layer; depositing an oxide onto the oxide liner on the trench to form a shallow trench isolation region; implanting dopants into the semiconductor to form a drain region in contact with the drift layer and having majority carriers of the first type; implanting dopants into the semiconductor to form a body region having majority carriers of a second type; forming a gate oxide over a portion of the drift layer and the body region; forming a gate over the gate oxide; and implanting dopants into the body region to form a source region having majority carriers of the first type.


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