The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2023
Filed:
Feb. 18, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Joseph A. Van Gompel, Austin, TX (US);
James L'Heureux, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
One or more embodiments described herein relate to abatement systems for reducing Brand Clin semiconductor processes. In embodiments described herein, semiconductor etch processes are performed within process chambers. Thereafter, fluorinated greenhouse gases (F-GHGs), HBr, and Clgases exit the process chamber and enter a plasma reactor. Reagent gases are delivered from a reagent gas delivery apparatus to the plasma reactor to mix with the process gases. Radio frequency (RF) power is applied to the plasma reactor, which adds energy and 'excites' the gases within the process chamber. When HBr is energized, it forms Br. Brand Clare corrosive and toxic. However, the addition of HO in the plasma reactor quenches the Brand Clemissions, as the H atoms recombine with the Br atoms and the Cl atoms to form HBr and HCl. HBr and HCl are readily water-soluble and removed through a wet scrubber.