The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2023

Filed:

Jan. 29, 2019
Applicant:

Jusung Engineering Co., Ltd., Gwangju-si, KR;

Inventors:

Woong Kyo Oh, Jwangju-si, KR;

Hyun Ho Koo, Gwangju-si, KR;

Kwang Su Yoo, Gwangju-si, KR;

Sang Du Lee, Gwangju-si, KR;

Kyu jung Cho, Gwangju-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H01J 2237/327 (2013.01);
Abstract

The present inventive concept relates to a substrate treatment apparatus comprising: a support part for supporting a substrate; a first electrode part disposed above the support part; a second electrode part disposed above the first electrode part; a generation hole formed to extend through the first electrode part; and a protruding electrode coupled to the second electrode part while protruding downward from the second electrode part at a position corresponding to the generation hole, wherein the protruding electrode is formed to have a shorter length than the first electrode part in the vertical direction.


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