The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 10, 2023

Filed:

Jun. 10, 2022
Applicant:

Technology Innovation Institute, Masdar, AE;

Inventors:

Fares B. Mehouachi, Abu Dhabi, AE;

Qingjie Yang, Abu Dhabi, AE;

Chaouki Kasmi, Abu Dhabi, AE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/05 (2011.01);
U.S. Cl.
CPC ...
G06T 17/05 (2013.01);
Abstract

Systems, methods, and computer-readable media for using full waveform inversion for imaging surveyed mediums are provided. The full waveform inversion uses a Sifrian functional to fully leverage Hessian information and update a model by augmenting and assembling data derived from the Sifrian functional when equilibrated. The Sifrian inversion produces high resolution images of the surveyed medium typically only seen with full Hessian inversions and can produce such images without requiring supercomputer computation power or extremely long computation time.


Find Patent Forward Citations

Mehouachi, Fares. (2023). Systems, methods, and computer-readable media for utilizing a sifrian inversion to build a model to generate an image of a surveyed medium (U.S. Patent No. 11551416). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11551416

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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