The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2023
Filed:
Aug. 24, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kyle M. Hanson, Kalispell, MT (US);
Gregory J. Wilson, Kalispell, MT (US);
Viachslav Babayan, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/38 (2006.01); C23C 16/56 (2006.01); H01L 21/67 (2006.01); C23C 16/54 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
G03F 7/38 (2013.01); C23C 16/54 (2013.01); C23C 16/56 (2013.01); H01L 21/67011 (2013.01); H01L 21/6719 (2013.01); H01L 21/67751 (2013.01);
Abstract
Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.