The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2023
Filed:
Feb. 11, 2021
Jasmina Markovski, Mesa, AZ (US);
Aliaksandr Sharstniou, Gilbert, AZ (US);
Stanislau Niauzorau, Gilbert, AZ (US);
Bruno Azeredo, Scottsdale, AZ (US);
Yifu Ding, Superior, CO (US);
Jasmina Markovski, Mesa, AZ (US);
Aliaksandr Sharstniou, Gilbert, AZ (US);
Stanislau Niauzorau, Gilbert, AZ (US);
Bruno Azeredo, Scottsdale, AZ (US);
Yifu Ding, Superior, CO (US);
Arizona Board of Regents on behalf of Arizona State University, Scottsdale, AZ (US);
The Regents of The University of Colorado, a Body Corporate, Denver, CO (US);
Abstract
A metal-assisted chemical imprinting stamp includes a porous polymer substrate and a noble metal coating formed directly on the porous polymer substrate. Fabricating the metal-assisted chemical imprinting stamp includes providing a porous polymer substrate, and disposing a noble metal on the porous polymer substrate. Metal-assisted chemical imprinting includes positioning a silicon substrate in an etching solution, contacting a surface of the silicon substrate with a stamp comprising a noble metal layer on a surface of a porous polymer substrate, and separating the silicon substrate from the stamp to yield a pattern corresponding to the noble metal layer on the silicon substrate.