The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2023

Filed:

Aug. 19, 2020
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventor:

Chih-Yen Chen, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/778 (2006.01); H01L 29/20 (2006.01); H01L 29/205 (2006.01); H01L 21/225 (2006.01); H01L 29/66 (2006.01); H01L 21/306 (2006.01); H01L 21/324 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7787 (2013.01); H01L 21/2258 (2013.01); H01L 21/30621 (2013.01); H01L 21/3245 (2013.01); H01L 29/0638 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/66462 (2013.01);
Abstract

A semiconductor device includes a substrate, a channel layer, a barrier layer, a compound semiconductor layer, a source/drain pair, a fluorinated region, and a gate. The channel layer is disposed over the substrate. The barrier layer is disposed over the channel layer. The compound semiconductor layer is disposed over the barrier layer. The source/drain pair is disposed over the substrate, wherein the source and the drain are located on opposite sides of the compound semiconductor layer. The fluorinated region is disposed in the compound semiconductor layer. The gate is disposed on the compound semiconductor layer.


Find Patent Forward Citations

Loading…