The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2023

Filed:

Dec. 28, 2020
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Andreas Riegler, Lichtpold, AT;

Wolfgang Jantscher, Villach, AT;

Manfred Pippan, Noetsch, AT;

Maik Stegemann, Pesterwitz, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/00 (2006.01); H01L 29/66 (2006.01); H01L 29/40 (2006.01); H01L 29/06 (2006.01); H01L 29/739 (2006.01); H01L 29/417 (2006.01); H01L 29/167 (2006.01); H01L 21/02 (2006.01); H01L 21/265 (2006.01); H01L 21/28 (2006.01); H01L 21/324 (2006.01); H01L 21/768 (2006.01); H01L 29/45 (2006.01); H01L 29/49 (2006.01); H01L 29/78 (2006.01); H01L 29/16 (2006.01); H01L 29/10 (2006.01); H01L 29/20 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66727 (2013.01); H01L 21/02063 (2013.01); H01L 21/2652 (2013.01); H01L 21/28035 (2013.01); H01L 21/324 (2013.01); H01L 21/76805 (2013.01); H01L 21/76814 (2013.01); H01L 21/76846 (2013.01); H01L 21/76895 (2013.01); H01L 29/0634 (2013.01); H01L 29/167 (2013.01); H01L 29/401 (2013.01); H01L 29/408 (2013.01); H01L 29/417 (2013.01); H01L 29/41741 (2013.01); H01L 29/456 (2013.01); H01L 29/4983 (2013.01); H01L 29/66719 (2013.01); H01L 29/7395 (2013.01); H01L 29/7802 (2013.01); H01L 29/1095 (2013.01); H01L 29/1608 (2013.01); H01L 29/2003 (2013.01);
Abstract

A MOSFET includes a semiconductor body having a first side, a drift region, a body region forming a first pn-junction with the drift region, a source region forming a second pn-junction with the body region, in a vertical cross-section, a dielectric structure on the first side and having an upper side; a first gate electrode, a second gate electrode, a contact trench between the first and second gate electrodes, extending through the dielectric structure to the source region, in a horizontal direction a width of the contact trench has, in a first plane, a first value, and, in a second plane, a second value which is at most about 2.5 times the first value, and a first contact structure arranged on the dielectric structure having a through contact portion arranged in the contact trench, and in Ohmic contact with the source region.


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