The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2023

Filed:

Mar. 09, 2021
Applicant:

Infineon Technologies Austria Ag, Villach, AT;

Inventors:

Hyeongnam Kim, Chandler, AZ (US);

Mohamed Imam, Chandler, AZ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/06 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0629 (2013.01); H01L 27/0605 (2013.01);
Abstract

A semiconductor die includes a barrier layer of type III-V semiconductor material, a channel layer of type III-V semiconductor material disposed below the barrier layer, the channel layer forming a heterojunction with the barrier layer such that a two-dimensional charge carrier gas is disposed in the channel layer near the heterojunction, a high-electron mobility transistor disposed in a first lateral region of the semiconductor die, the high-electron mobility transistor comprising source and drain electrodes that each are in ohmic contact with the two-dimensional charge carrier gas and a gate structure that is configured to control a conductive connection between the source and drain electrodes, and a capacitor that is monolithically integrated into the semiconductor die and is disposed in a second lateral region of the semiconductor die, a dielectric medium of the capacitor includes a first section of the barrier layer.


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