The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2023
Filed:
Jun. 23, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Shantanu Rajiv Gadgil, Santa Clara, CA (US);
Sumit Subhash Patankar, Fremont, CA (US);
Nathan Arron Davis, Gilbert, AZ (US);
Allen L. D'Ambra, Burlingame, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B24B 37/27 (2012.01); B08B 3/00 (2006.01); B08B 1/04 (2006.01); B24B 37/34 (2012.01); B24B 37/12 (2012.01); B24B 57/00 (2006.01); H01L 21/306 (2006.01); B24B 55/04 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6704 (2013.01); B08B 1/04 (2013.01); B08B 3/003 (2013.01); B24B 37/27 (2013.01); B24B 37/34 (2013.01); B24B 37/12 (2013.01); B24B 55/04 (2013.01); B24B 57/00 (2013.01); H01L 21/304 (2013.01); H01L 21/30625 (2013.01);
Abstract
In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.