The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2023
Filed:
Mar. 07, 2018
Applicant:
Thinkon New Technology Japan Corporation, Tokyo, JP;
Inventors:
Atsushi Ikari, Shunan, JP;
Satoshi Fujii, Tokyo, JP;
Assignee:
THINKON NEW TECHNOLOGY JAPAN CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/24 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); H01J 37/241 (2013.01); H01J 37/3255 (2013.01); H01J 37/32541 (2013.01); H01J 37/32559 (2013.01); H01J 37/32697 (2013.01);
Abstract
Provided is a protective material ring in which a plurality of silicon members are joined. A protective material ring is to be installed in a treatment chamber of a substrate treatment apparatus performing plasma treatment on a substrate, and the substrate is accommodated in the treatment chamber. The protective material ring includes: three or more silicon members; and a joining part joining the silicon members. The joining part contains boron oxide.